| 摘要 |
PROBLEM TO BE SOLVED: To improve the evenness of a plasma treatment. SOLUTION: The optical width corresponding to the width of a microwave guide window in a region pinched by the outer periphery of an upper electrode 18 facing a sample bed 3 and the inner periphery of a ring member 10 and annularly exposed to a treating chamber 2 (the width obtained by multiplying the actual width and the square root of the relative dielectric constant of a medium) is set to the half-wavelength or above in vacuum of the microwaves generated by a microwave oscillator 20. The microwaves guided to an annular waveguide type antenna section 12a from the microwave oscillator 20 are introduced into the treating chamber 2 through a microwave guide window with high efficiency. The evenness of the density of the plasma generated in the treating chamber 2 is improved, and the evenness of the plasma treating applied to a sample substrate W is increased.
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