发明名称 CONTROLLER OF PLASMA FORMATION REGION AND PLASMA PROCESSOR
摘要 There is provided a plasma formation region control apparatus, with which a large-scale plasma can be obtained under a high pressure with ease and at low cost. The plasma formation region control apparatus comprises a microwave oscillator, an antenna connected to the microwave oscillator, and control means for controlling the position of each of the microwave oscillator and the antenna. The control means positions the antenna towards a plasma formation region in accordance with a specification for a plasma region for respective points in time t; establishes a driving sequence for the microwave oscillator based on the temperature state of the specified plasma; and drives the microwave oscillator according to the driving sequence.
申请公布号 EP2178350(B1) 申请公布日期 2016.04.13
申请号 EP20080791116 申请日期 2008.07.12
申请人 IMAGINEERING, INC. 发明人 IKEDA, YUJI
分类号 H05H1/24;H05H1/00 主分类号 H05H1/24
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