METHODS AND SYSTEMS FOR GROWING BINARY, TERNARY AND QUATERNARY MATERIALS ON A SUBSTRATE

摘要

Methods and systems for forming a material on a substrate are provided. Aspects of the methods involve the controlled introduction of a plurality of vapor reactants into a deposition chamber to form a material on the substrate having uniform surface roughness, conformality, thickness and composition. Aspects of the systems include a vapor feed component, a vapor distribution component, a containment component, and a controller configured to operate the systems to carry out the methods.