发明名称 BARIUM-SILICIDE-BASED BULK BODY, BARIUM-SILICIDE-BASED SPUTTERING TARGET, AND METHOD FOR MANUFACTURING BARIUM-SILICIDE-BASED CRYSTALLINE FILM USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a barium-silicide-based bulk polycrystalline body, a barium-silicide-based film, and an application for the same.SOLUTION: A barium-silicide-based bulk polycrystalline body is characterized in that [M]/([Ba]+[Si]+[M]) is 0.01-20 atm% and the oxygen content is 20 atm% or less, where [Ba], [Si], and [M] respectively represent the amount of barium, silicon, and a metal element M (at least one element selected from the group consisting of strontium, calcium, and magnesium).
申请公布号 JP2015221744(A) 申请公布日期 2015.12.10
申请号 JP20150072906 申请日期 2015.03.31
申请人 TOSOH CORP 发明人 MESHIDA MASAMI;KURAMOCHI TOSHIHITO
分类号 C04B35/58;C01B33/06;C23C14/06;C23C14/34;H01L35/22;H01L35/34 主分类号 C04B35/58
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