| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To remove charges accumulated during the defect correction of a photomask by electron beams even in an electron beam defective correction device of which the test piece chamber is vacuum. <P>SOLUTION: Nitrogen introduced in the electron defect correction device by a gas introducing system 1 is ionized byα-rays generated by anα-ray source 2 such as polonium, and the ionized nitrogen is irradiated on a portion 4 charged up by the irradiation of electron beams, and destaticizes it. Otherwise, nitrogen or water vapor introduced in the electron beam defect correction device by the gas introducing system 1 is ionized by soft X-rays and the ionized nitrogen or vapor is irradiated on the portion charged up by the irradiation of the electron beams, and destaticizes it. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p> |
