发明名称 CLEANING OF DEPOSITION DEVICE BY INJECTING CLEANING GAS INTO DEPOSITION DEVICE
摘要 Embodiments relate to a deposition device that operates in two modes: a deposition mode, and a cleaning mode. In the deposition mode, modular injectors inject materials onto a substrate to form a layer. In the cleaning mode, the deposition device is cleaned without disassembly by injecting a cleaning gas. The injector module assembly may be cleaned in the cleaning mode by injecting cleaning gas through an exhaust for removing reactant precursor and routing the cleaning gas from the exhaust to another exhaust for removing source precursor. Alternatively, the injector module assembly is cleaned by injecting cleaning gas into a passage between an injector for injecting a source precursor and another injector for injecting a reactant precursor, and routing the cleaning gas to one of the exhausts in the cleaning mode.
申请公布号 US2015259793(A1) 申请公布日期 2015.09.17
申请号 US201514645258 申请日期 2015.03.11
申请人 Veeco ALD Inc. 发明人 Lee Sang In;Pak Samuel S.;Lee Daniel Ho;Yang Hyoseok Daniel
分类号 C23C16/44;H01J37/32;C23C16/455 主分类号 C23C16/44
代理机构 代理人
主权项 1. A method of operating an injector module assembly, comprising: injecting first gas for depositing a first material onto a substrate by a first reaction chamber in a deposition mode; discharging the first gas remaining after injecting the first gas onto the substrate through a first exhaust in the deposition mode; injecting second gas for removing a second material deposited on the injector module assembly through the first exhaust of the injector module assembly in a cleaning mode; and routing the second gas from the first exhaust to a second exhaust of the injector module assembly in the cleaning mode to remove the second material deposited on a portion of the injector module assembly between the first exhaust and the second exhaust.
地址 Fremont CA US