Method to produce nanometer-sized features with directed assembly of block copolymers

摘要

Methods for fabricating stamps and systems for patterning a substrate, and devices resulting from those methods are provided.

主权项

1. A method of forming a stamp, comprising:
forming a trench in a material overlying a substrate, the trench comprising an unpatterned, neutral wetting floor, opposing preferential wetting ends, and opposing parallel preferential wetting sidewalls separated from one another by a fixed width; chemically modifying a polymer block of a PS-b-PMMA copolymer having an inherent pitch (Lo) equal to a depth of the trench to comprise a thiol functional group or an amine functional group to form a modified PS-b-PMMA copolymer comprising a first polymer block having chemical affinity for and swellable by an ink material and a second polymer block not having chemical affinity for and not swellable by the ink material; filling the trench with the modified PS-b-PMMA copolymer; and annealing the modified PS-b-PMMA copolymer to form a stamping surface comprising an ordered array of polymer domains of the first polymer block in a matrix of the second polymer block.