发明名称 |
METHOD OF FORMING CONDUCTIVE FILMS WITH MICRO-WIRES |
摘要 |
A pattern of conductive micro-wires as in a conductive pattern can be prepared using photo-lithography, or imprint technology. A photocurable composition is cured to form a pattern of photocured micro-channels. A conductive composition comprising metal nano-particles is added to the photocured micro-channels and excess conductive composition outside the photocured micro-channels is removed. The conductive composition in the photocured micro-channels is then dried at a temperature of less than 60° C. The dried conductive composition in the photocured micro-channels is treated with hydrogen chloride vapor to form conductive micro-wires in the photocured micro-channels at a temperature of less than 60° C. The outer surface of the conductive micro-wires is then polished in the presence of water, to form a micro-wire pattern. |
申请公布号 |
US2015064426(A1) |
申请公布日期 |
2015.03.05 |
申请号 |
US201314017638 |
申请日期 |
2013.09.04 |
申请人 |
Wang Yongcai;Lebens John Andrew;Wright Mitchell Lawrence |
发明人 |
Wang Yongcai;Lebens John Andrew;Wright Mitchell Lawrence |
分类号 |
H01B13/00;H01B1/02;H01B13/30 |
主分类号 |
H01B13/00 |
代理机构 |
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代理人 |
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主权项 |
1. A method of making a micro-wire pattern in an article, the method comprising:
providing a photocurable article comprising a photocurable composition on a transparent substrate, forming a pattern of micro-channels within the photocurable composition, exposing the photocurable composition to curing radiation to form cured photocurable composition and photocured micro-channels within the cured photocurable composition on the transparent substrate, applying a conductive composition comprising metal nano-particles to the photocured micro-channels, removing any excess conductive composition outside the photocured micro-channels while leaving conductive composition within the photocured micro-channels, drying the conductive composition in the photocured micro-channels at a temperature of less than 60° C. to provide a dried conductive composition as conductive micro-wires in the photocured micro-channels, exposing the dried conductive composition in the photocured micro-channels to hydrogen chloride at a temperature of less than 60° C. to enhance the conductivity of the conductive micro-wires in the photocured micro-channels, and polishing the outer surface of the cured photocurable composition in the presence of water, to form a micro-wire pattern on the transparent substrate. |
地址 |
Rochester NY US |