发明名称 Substrate for liquid crystal display device including peripheral lines having openings and fabricating method thereof
摘要 A liquid crystal display device includes a substrate having a display region and a non-display region. In the display region, the gate line and a data line cross to define a pixel region and a thin film transistor is disposed at the crossing portion of the gate and data lines. The thin film transistor includes a gate electrode and source and drain electrodes. A peripheral line having a plurality of openings is disposed in the non-display region. The openings are slits, rectangles, circles, or triangles. The openings relieve plasma during dry-etching of the peripheral line. A pixel electrode is connected to the drain electrode in the pixel region.
申请公布号 US8836901(B2) 申请公布日期 2014.09.16
申请号 US201213591872 申请日期 2012.08.22
申请人 LG Display Co., Ltd. 发明人 Lee Deok-Won
分类号 G02F1/1333;G02F1/1343;G02F1/1345;G02F1/1362 主分类号 G02F1/1333
代理机构 Brinks Gilson & Lione 代理人 Brinks Gilson & Lione
主权项 1. A method of fabricating a display device, the method comprising: forming a gate line and a gate electrode on a substrate, the substrate having a display region and a non-display region; forming first and second semiconductor layers, a data line, source and drain electrodes and a peripheral line, wherein the data line crosses the gate line to define a pixel region in the display region, and the peripheral line has a plurality of openings in the non-display region; forming a passivation layer on the peripheral line in the non-display region; and forming a pixel electrode connected to the drain electrode in the pixel region, wherein the second semiconductor layer extends along and below the peripheral line, and the passivation layer directly contacts the second semiconductor layer, etching a metal layer in an etching process to form a source-drain electrode pattern, the data line, and the peripheral line, and etching the plurality of openings in the peripheral line in the same etching process, and wherein when the passivation layer is applied on the data line and the peripheral line, the passivation layer fills in the openings of the peripheral line.
地址 Seoul KR