发明名称 Process for making self-patterning substrates and the product thereof
摘要 The present invention relates to a process for making self-patterning substrates comprising the steps of providing electrically conductive traces on a substrate; pre-coating the substrate with at least a layer of complementary reactant electrically resistant reactant formulations; altering the conductivity of complementary reactant formulation selectively upon application of external source of energy and a self-patterning substrate using the said process.
申请公布号 US8747599(B2) 申请公布日期 2014.06.10
申请号 US20080230055 申请日期 2008.08.22
申请人 发明人 Sastry Chidella Krishna;Sharma Chidella Venkata Krishna Mohan;Tangirala Srinivas
分类号 B32B27/00 主分类号 B32B27/00
代理机构 代理人
主权项 1. A process for making self-patterning substrates comprising: providing electrically conductive traces on a substrate by: coating the substrate at least partially with at least a layer of complementary reactant electrically resistant reactant formulation exhibiting a higher electrical resistance with respect to final conductive traces generated for a given coating surface area and thickness; altering conductivity of the complementary reactant electrically resistant reactant formulation by applying energy from a source of energy to the layer to form the electrically conductive traces; and triggering a redox reaction leading to a formation of the electrically conductive traces, wherein the complementary reactant electrically resistant reactant formulation comprises at least one of precursors of metals, precursors of oxidizers oxidizing the complementary reactant electrically resistant reactant formulation, and precursors of reducers reducing the complementary reactant electrically resistant reactant formulation, and the precursors of oxidizers or the precursors of reducers are capable of not undergoing chemical reactions under a temperature in a range from 10 to 40° C.
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