发明名称 METHODS OF USING POLISHED SILICON WAFER STRIPS FOR EUV HOMOGENIZER
摘要 <p>The present invention is a light homogenizer or light tunnel with highly reflective sides that enable the focusing of EUV illumination. The sides of the homogenizer are cut from a highly polished silicon wafer. The wafer is coated with a reflective coating before the strips are cut from the wafer. The invention also includes a method for flattening the strips and applying a backing to the strips enabling easier manipulation of the strips during assembly and use.</p>
申请公布号 WO2014085442(A1) 申请公布日期 2014.06.05
申请号 WO2013US71986 申请日期 2013.11.26
申请人 KLA-TENCOR CORPORATION 发明人 WANG, DAIMIAN;CHILESE, FRANK
分类号 G02B27/09;G01N21/88;H01L21/027 主分类号 G02B27/09
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