发明名称 |
METHODS OF USING POLISHED SILICON WAFER STRIPS FOR EUV HOMOGENIZER |
摘要 |
<p>The present invention is a light homogenizer or light tunnel with highly reflective sides that enable the focusing of EUV illumination. The sides of the homogenizer are cut from a highly polished silicon wafer. The wafer is coated with a reflective coating before the strips are cut from the wafer. The invention also includes a method for flattening the strips and applying a backing to the strips enabling easier manipulation of the strips during assembly and use.</p> |
申请公布号 |
WO2014085442(A1) |
申请公布日期 |
2014.06.05 |
申请号 |
WO2013US71986 |
申请日期 |
2013.11.26 |
申请人 |
KLA-TENCOR CORPORATION |
发明人 |
WANG, DAIMIAN;CHILESE, FRANK |
分类号 |
G02B27/09;G01N21/88;H01L21/027 |
主分类号 |
G02B27/09 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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