| 发明名称 |
Method for patterning polymer surface |
| 摘要 |
The invention provides a method for patterning a polymer surface. A polymer layer is formed on a substrate. A conductive grid with a mesh pattern is placed on the polymer layer. The mesh pattern is transferred to the polymer layer by a plasma treatment. The conductive grid is then removed. |
| 申请公布号 |
US8728584(B2) |
申请公布日期 |
2014.05.20 |
| 申请号 |
US20090576666 |
申请日期 |
2009.10.09 |
| 申请人 |
HSIEH SHU-CHEN;NATIONAL SUN YAT-SEN UNIVERSITY |
发明人 |
HSIEH SHU-CHEN |
| 分类号 |
H05H1/00;C03C15/00;C03C25/68 |
主分类号 |
H05H1/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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