发明名称 Extreme ultraviolet light source
摘要 Techniques are described that enhance power from an extreme ultraviolet light source with feedback from a target material that has been modified prior to entering a target location into a spatially-extended target distribution or expanded target. The feedback from the spatially-extended target distribution provides a nonresonant optical cavity because the geometry of the path over which feedback occurs, such as the round-trip length and direction, can change in time, or the shape of the spatially-extended target distribution may not provide a smooth enough reflectance. However, it may be possible that the feedback from the spatially-extended target distribution provides a resonant and coherent optical cavity if the geometric and physical constraints noted above are overcome. In any case, the feedback can be generated using spontaneously emitted light that is produced from a non-oscillator gain medium.
申请公布号 US8680495(B1) 申请公布日期 2014.03.25
申请号 US201313843626 申请日期 2013.03.15
申请人 CYMER, INC.;CYMER, LLC 发明人 TAO YEZHENG;RAFAC ROBERT JAY;FOMENKOV IGOR V.;BROWN DANIEL J. W.
分类号 G21K5/00 主分类号 G21K5/00
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