| 摘要 |
A gas distribution system (28) for a reactor having at least two distinct gas source orifice array (30, 32) displaced from one another along an axis (2) defined by a gas flow direction from the gas source orifice arrays (30, 32) towards a work-piece deposition surface such that at least a lower one of the gas source orifice arrays (30, 32) is located between a higher one of the gas source orifice arrays (30, 32) and the work-piece deposition surface. Orifices (36a, 36d) in the higher one of the gas source orifice arrays (30, 32) may spaced an average of 0.2 - 0.8 times a distance between the higher one of the gas source orifice arrays (30, 32) and the work-piece deposition surface, whiles orifices (44a-44c) in the lower one of the gas source orifice arrays (30, 32) may be spaced an average of 0.1 - 0.4 times a distance between the higher one of the gas source orifice arrays (30, 32) and the work-piece deposition surface. |
