发明名称 |
Base generator |
摘要 |
A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.
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申请公布号 |
US8476444(B2) |
申请公布日期 |
2013.07.02 |
申请号 |
US20090935112 |
申请日期 |
2009.03.30 |
申请人 |
KATAYAMA MAMI;FUKUDA SHUNJI;SAKAYORI KATSUYA;DAI NIPPON PRINTING CO., LTD. |
发明人 |
KATAYAMA MAMI;FUKUDA SHUNJI;SAKAYORI KATSUYA |
分类号 |
C07D213/72;C07D211/06;C07D213/75 |
主分类号 |
C07D213/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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