发明名称 Base generator
摘要 A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.
申请公布号 US8476444(B2) 申请公布日期 2013.07.02
申请号 US20090935112 申请日期 2009.03.30
申请人 KATAYAMA MAMI;FUKUDA SHUNJI;SAKAYORI KATSUYA;DAI NIPPON PRINTING CO., LTD. 发明人 KATAYAMA MAMI;FUKUDA SHUNJI;SAKAYORI KATSUYA
分类号 C07D213/72;C07D211/06;C07D213/75 主分类号 C07D213/72
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