发明名称 |
TOP ELECTRODE TEMPLATING FOR DRAM CAPACITOR |
摘要 |
A method for forming a DRAM MIM capacitor stack having low leakage current involves the use of a first electrode that serves as a template for promoting the high k phase of a subsequently deposited dielectric layer. The high k dielectric layer comprises a doped material that can be crystallized after a subsequent annealing treatment. A metal oxide second electrode layer is formed above the dielectric layer. The metal oxide second electrode layer has a crystal structure that is compatible with the crystal structure of the dielectric layer. Optionally, a second electrode bulk layer is formed above the metal oxide second electrode layer.
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申请公布号 |
US2013122681(A1) |
申请公布日期 |
2013.05.16 |
申请号 |
US201113294309 |
申请日期 |
2011.11.11 |
申请人 |
MALHOTRA SANDRA;CHEN HANHONG;DEWEERD WIM;ODE HIROYUKI;ELPIDA MEMORY, INC.;INTERMOLECULAR, INC. |
发明人 |
MALHOTRA SANDRA;CHEN HANHONG;DEWEERD WIM;ODE HIROYUKI |
分类号 |
H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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