Lithographic projection apparatus, control apparatus and device manufacturing method

摘要

An immersion lithographic apparatus is disclosed that has a measurement system (MS) or a prediction system (PS) for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system (CS) for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.