发明名称 METHOD OF MANUFACTURING NITRIDE SEMICONDUCTOR LASER DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To improve the characteristics of a nitride semiconductor laser device having a convex ridge composed of a p-type cladding layer made from Mg-doped AlGaN. <P>SOLUTION: After forming a ridge portion 16A by dry-etching a p-type cladding layer 16 made from Mg-doped AlGaN, a surface of the p-type cladding layer 16 is wet-etched using hot phosphoric acid. As a result of this step, a damage layer on the side surfaces of the ridge portion 16A can be removed while maintaining controllability of the depth (film thickness) of the p-type cladding layer 16 on both sides of the ridge portion 16A. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012186330(A) 申请公布日期 2012.09.27
申请号 JP20110048726 申请日期 2011.03.07
申请人 OPNEXT JAPAN INC 发明人 FUKAI HARUNORI;NAKAHARA KOJI
分类号 H01S5/22;H01S5/323 主分类号 H01S5/22
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