发明名称 |
LARGE SCALE PLASMA CHAMBER |
摘要 |
PURPOSE: A plasma chamber having a large area is provided to obtain uniform plasma density and high energy efficiency by adopting an adaptive plasma source. CONSTITUTION: A large area plasma chamber(100) has an internal reaction space which is limited by an outer wall of a chamber(102). A susceptor(106) supporting a liquid crystal display panel(104) is arranged on the floor of the large area plasma chamber. The susceptor is connected to a bias power supply source for applying the bias power. A plurality of unit windows(121) is arranged on a top window area(120). A plurality of unit windows is respectively separated by a window frame(122). The unit windows serve as a vacuum seal between the large area plasma chamber and the outside. A window frame(122a) which contacts the outer wall of the chamber is made out of an insulating material in order to allow the window frame to float. |
申请公布号 |
KR20120093016(A) |
申请公布日期 |
2012.08.22 |
申请号 |
KR20110013002 |
申请日期 |
2011.02.14 |
申请人 |
ADAPTIVE PLASMA TECHNOLOGY CORP. |
发明人 |
KIM, NATHAN;LEE, SANG WOO |
分类号 |
H05H1/46;H05H1/24 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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