METAL ORGANIC CHEMICAL VAPOR DEPOSITION APPARATUS AND CHAMBER ASSEMBLY THEREFOR

摘要

Provided is a metal organic chemical vapor deposition apparatus and a chamber assembly therefor. The chamber assembly comprises: a chamber comprising a reaction chamber comprising a gas inlet channel for supplying gas to the reaction chamber and a gas exhaust channel for exhausting gas from the reaction chamber; and a first support tray and a second support tray, disposed inside the reaction chamber, for supporting wafers, the wafer-supporting surface of the first support tray and the wafer-supporting surface of the second support tray being opposite each other. Disposing two wafer-supporting trays opposite each other in the reaction chamber greatly increases reaction chamber capacity and the gas utilization rate, thereby improving production efficiency and reducing production cost.