| 摘要 |
<p>PURPOSE: An antenna for generating plasma and a substrate processing apparatus including the same are provided to apply power to a plurality of antennas by forming each lead-in part of a plurality of antennas installed around a lead in a central part of the lead into coaxial. CONSTITUTION: An antenna is composed of a first antenna and a second antenna. A feed line(120) is composed of a first feed line(120a) and a second feed line(120b). First and second lead-in parts(140a, 140b) of the first and the second antennas are arranged to be coaxial from a coaxial part(142) located at a right center of the lead. The first antenna includes a plurality of first sub antennas(150) having an semicircle arch shape branched from a bottom part of the first lead-in part. Each sub antenna comprises a first bifurcated part(152), a first front-end part(154), a first termination part(156), and a first bend part(158).</p> |
