| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition with high sensitivity and molding accuracy, and a method for producing a fine structure and a liquid discharge device in which a discharge port having a high-definition shape is provided by using the composition. <P>SOLUTION: The photosensitive resin composition contains (a) a compound polymerizable by an acid, and (b) a photoacid generator comprising an onium salt containing a cationic part structure represented by formula (b1) and an anionic part structure represented by formula (b2), wherein the component (b) absorbs ≥50% of the amount of 365 nm wavelength light absorbed by the photosensitive resin composition. By using the photosensitive resin composition, the fine structure and the liquid discharge device in which the discharge port having the high-definition shape is provided are obtained. In formula (b1), R<SB>1</SB>to R<SB>3</SB>are each independently a 1-30C organic group. In formula (b2), X is selected from a carbon atom, a nitrogen atom, a phosphorus atom, a boron atom, and an antimony atom; Y is selected from -S(=O)<SB>2</SB>-, -CF<SB>2</SB>-O-, -CF<SB>2</SB>-C(=O)-, -CF<SB>2</SB>-O-C(=O)-, etc., and a single bond; R<SB>4</SB>is a 1-30C hydrocarbon group which may be substituted by a fluorine atom, and when Y is -S(=O)<SB>2</SB>- or a single bond, R<SB>4</SB>has at least one fluorine atom; and when X is a carbon atom, m and n are each an integer which satisfies m+n=3 and n=0-2, and when X is a nitrogen atom, m and n are each an integer which satisfies m+n=2 and n=0-1. <P>COPYRIGHT: (C)2011,JPO&INPIT |
