发明名称 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
摘要 According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes an arylsulfonium salt that when exposed to actinic rays or radiation, generates an acid, the arylsulfonium salt containing at least one aryl ring on which there are a total of one or more electron donating groups, the acid generated upon exposure to actinic rays or radiation having a volume of 240Å3 or greater.
申请公布号 US2011189609(A1) 申请公布日期 2011.08.04
申请号 US201113015874 申请日期 2011.01.28
申请人 FUJIFILM CORPORATION 发明人 KAWABATA TAKESHI;TSUCHIMURA TOMOTAKA;ITO TAKAYUKI
分类号 G03F7/004;C07C309/31;C07D327/08;C07D333/76;G03F7/20 主分类号 G03F7/004
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