| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of efficiently exchanging large masks and preventing deposition of contaminations on a mask to be used in the next exposure process. <P>SOLUTION: The exposure apparatus 1 includes an original plate exchanging device 6 including a stocker that stores a plurality of original plates M and MP and a conveyance path 7 for conveying the original plate M to an original plate stage 3, for exchanging the original plate M to be mounted on the original plate stage 3. The conveyance path 7 is a straight passage disposed directing above the original plate stage 3. The original plate exchanging device 6 includes: a truck 9 suspended from the conveyance path 7 and having a hand 11 for holding the original plate M; and a waiting chamber 8 disposed directly under the conveyance path 7. During a first exposure process time when the first original plate M is used, a second original plate MP to be used in a second exposure process time is preliminarily conveyed from the stocker to the waiting chamber 8 and kept to wait in the waiting chamber 8. <P>COPYRIGHT: (C)2011,JPO&INPIT |
