GAS-PHASE TREATMENT DEVICE, GAS-PHASE TREATMENT METHOD, AND SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a gas-phase treatment device capable of keeping the quality of treatment well even when different treatment is performed, and a gas-phase treatment method. SOLUTION: This gas-phase treatment device 1 includes: a treatment chamber 4 for circulating a reaction gas; gas supply openings 13-15 as a plurality of gas introduction parts formed along the circulation direction of the reaction gas on a first wall surface (upper wall 6) of the treatment chamber 4; gas supply parts capable of supplying gas from each of one gas introduction part and another gas introduction part different from the one gas introduction part into the treatment chamber 4 in the gas supply openings 13-15 as the plurality of gas introduction parts. The plurality of gas supply parts includes first buffer chambers (buffer chambers 23-25) for supplying the gas to the gas introduction parts from the gas supply parts, and flow regulation parts 50 for supplying the gas to the first buffer chambers at uniform pressure, wherein the first buffer chambers are located on the downstream side in the gas circulation direction with respect to the flow regulation parts 50. COPYRIGHT: (C)2011,JPO&INPIT