发明名称 Test pad design for reducing the effect of contact resistances
摘要 An integrated circuit structure includes a semiconductor wafer; integrated circuit devices in the semiconductor wafer; and a plurality of test pads on a top surface of the semiconductor wafer and connected to the integrated circuit devices. Test pads are grouped in pairs, with the test pads in a same pair are interconnected.
申请公布号 US7825678(B2) 申请公布日期 2010.11.02
申请号 US20080196531 申请日期 2008.08.22
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 DOONG YIH-YUH;LO TSENG CHIN;LEE CHIEN-CHANG;SHAO CHIH-CHIEH
分类号 G01R31/02 主分类号 G01R31/02
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