发明名称 Accurate measurement of layer dimensions using XRF
摘要 A method for inspection of a sample includes directing an excitation beam to impinge on an area of a planar sample that includes a feature having sidewalls perpendicular to a plane of the sample, the sidewalls having a thin film thereon. An intensity of X-ray fluorescence (XRF) emitted from the sample responsively to the excitation beam is measured, and a thickness of the thin film on the sidewalls is assessed based on the intensity. In another method, the width of recesses in a surface layer of a sample and the thickness of a material deposited in the recesses after polishing are assessed using XRF.
申请公布号 US7804934(B2) 申请公布日期 2010.09.28
申请号 US20080272050 申请日期 2008.11.17
申请人 发明人 AGNIHOTRI DILEEP;O'DELL JEREMY;MAZOR ISAAC;YOKHIN BORIS
分类号 G01N23/223;G01T1/36 主分类号 G01N23/223
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