| 摘要 |
<p>PURPOSE: A reticle for fabricating a semiconductor device and an exposure method using the same are provided to reduce manufacturing costs and simplify process steps. CONSTITUTION: A frame area surrounds a main cell reserved area and includes an exposure and alignment pattern mounted therein. First and second device monitor pattern(114, 116) are loaded on one side of the frame area. Third and fourth device monitor pattern(118, 120) are mounted in the other side opposite to the one side of the frame area. First and the second pattern opening are formed on one of the first or the fourth device monitor pattern. At least more than two auxiliary patterns is formed on one of the first or the fourth device monitor pattern.</p> |
