发明名称 SUBSTRATE TRANSFERRING DEVICE, SUBSTRATE MANUFACTURING SYSTEM HAVING THE SAME AND METHOD OF TRANSFERRING SUBSTRATE
摘要 <p>PURPOSE: A substrate transferring device, a substrate processing system, and a substrate transferring method are provided to prevent mapping defect caused by misalignment by aligning a semiconductor substrate before loading a semiconductor substrate accepted in an accepting case. CONSTITUTION: A receiving portion(110) is included in the front of a frame. An index(120) draws a semiconductor substrate from the receiving portion and transfers the semiconductor. A work processing part(130) processes the semiconductor substrate offered from the index. The receiving portion comprises a plurality of receiving boxes(111). An opener(122) opens and closes the door of the receiving box.</p>
申请公布号 KR20100059484(A) 申请公布日期 2010.06.04
申请号 KR20080118272 申请日期 2008.11.26
申请人 SEMES CO., LTD. 发明人 KIM, DAE HUN;JANG, SUNG HO
分类号 H01L21/68;H01L21/677;H01L21/683 主分类号 H01L21/68
代理机构 代理人
主权项
地址