发明名称 |
SUBSTRATE TRANSFERRING DEVICE, SUBSTRATE MANUFACTURING SYSTEM HAVING THE SAME AND METHOD OF TRANSFERRING SUBSTRATE |
摘要 |
<p>PURPOSE: A substrate transferring device, a substrate processing system, and a substrate transferring method are provided to prevent mapping defect caused by misalignment by aligning a semiconductor substrate before loading a semiconductor substrate accepted in an accepting case. CONSTITUTION: A receiving portion(110) is included in the front of a frame. An index(120) draws a semiconductor substrate from the receiving portion and transfers the semiconductor. A work processing part(130) processes the semiconductor substrate offered from the index. The receiving portion comprises a plurality of receiving boxes(111). An opener(122) opens and closes the door of the receiving box.</p> |
申请公布号 |
KR20100059484(A) |
申请公布日期 |
2010.06.04 |
申请号 |
KR20080118272 |
申请日期 |
2008.11.26 |
申请人 |
SEMES CO., LTD. |
发明人 |
KIM, DAE HUN;JANG, SUNG HO |
分类号 |
H01L21/68;H01L21/677;H01L21/683 |
主分类号 |
H01L21/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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