发明名称 LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
摘要 Provided is a liquid processing apparatus (method) that forms a coating film by supplying and pouring a coating solution from a coating solution nozzle onto a surface of a substrate held substantially horizontally by a substrate holder. In the liquid processing apparatus (method), a unit for photographing a leading end portion of a coating solution nozzle 10 is provided. When performing a process for anti-drying of the coating solution for a long period of time in advance, a position of the coating solution and a position of an anti-drying liquid are set by using a soft scale 121a displayed on a screen where the photographed image is displayed. Therefore, a dispense control is performed based on a set value without depending on the naked eyes and a control for suppressing the drying of the coating solution in the leading end portion of the coating solution nozzle is performed.
申请公布号 US2010098869(A1) 申请公布日期 2010.04.22
申请号 US20090582860 申请日期 2009.10.21
申请人 TOKYO ELECTRON LIMITED 发明人 KINOSHITA MICHIO
分类号 B05D1/02;B05C11/00 主分类号 B05D1/02
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