| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a semiconductor device, a semiconductor manufacturing apparatus, and a storage medium, which suppress abnormal arc discharge occurring when plasma is excited while preventing misalignment of a substrate placed on an electrostatic chuck. SOLUTION: The method includes: a first process in which a substrate to be processed is placed on an electrostatic chuck in a reaction container and a first electrostatic chuck voltage HV1 is applied to the electrostatic chuck to absorb the substrate to be processed onto the electrostatic chuck; a second process in which the first electrostatic chuck voltage HV1 is reduced to a second electrostatic chuck voltage HV2; a third process in which a high-frequency voltage is applied between parallel plate electrodes in the reaction container to generate plasma; and a fourth process in which the second electrostatic chuck voltage HV2 is changed to a third electrostatic chuck voltage HV3 higher than the second electrostatic chuck voltage HV2. COPYRIGHT: (C)2010,JPO&INPIT |
