发明名称 |
Apparatus and methods for nanolithography using nanoscale optics |
摘要 |
An apparatus and methods for nanolithography using nanoscale optics are disclosed herein. Submicron-scale structures may be obtained using standard photolithography systems with a de-magnifying lens. A de-magnifying lens for use in a standard photolithography system includes a film having a top surface, a bottom surface and a plurality of cylindrical channels containing a dielectric material; and an array of carbon nanotubes penetrating the film through the plurality of cylindrical channels, wherein an image on the top surface of the film is converted into a de-magnified image on the bottom surface of the film by the carbon nanotubes.
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申请公布号 |
US7634162(B2) |
申请公布日期 |
2009.12.15 |
申请号 |
US20060509271 |
申请日期 |
2006.08.24 |
申请人 |
THE TRUSTEES OF BOSTON COLLEGE |
发明人 |
KEMPA KRZYSZTOF J.;NAUGHTON MICHAEL J.;REN ZHIFENG;RYBCZYNSKI JAKUB A. |
分类号 |
G02B6/32;G02B6/00;G02B6/06 |
主分类号 |
G02B6/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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