| 发明名称 |
VORRICHTUNG UND VERFAHREN ZUR KONTINUIERLICHEN GASPHASENABSCHEIDUNG UNTER ATMOSPHÄRENDRUCK UND DEREN VERWENDUNG |
| 摘要 |
<p>A device and a method for continuous chemical vapour deposition under atmospheric pressure on substrates. The device is hereby based on a reaction chamber, along the open sides of which the substrates are guided, as a result of which the corresponding coatings can be effected on the side of the substrates which is orientated towards the chamber interior.</p> |
| 申请公布号 |
DE502006004463(D1) |
申请公布日期 |
2009.09.17 |
| 申请号 |
DE20065004463T |
申请日期 |
2006.09.22 |
| 申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
发明人 |
REBER, STEFAN;HURRLE, ALBERT;SCHILLINGER, NORBERT |
| 分类号 |
C23C16/54;C23C16/455 |
主分类号 |
C23C16/54 |
| 代理机构 |
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