发明名称 Electrode for thin film capacitor devices
摘要 A method of forming a conductor on a substrate including steps of depositing tantalum on a glass layer of the substrate; oxidizing the tantalum; and depositing a noble metal on the oxidized tantalum to form the conductor. The method can be used to form a ferroelectric capacitor or other thin film ferroelectric device. The device can include a substrate comprising a glass layer; and an electrode connected to the glass layer. The electrode comprising can include a noble metal connected to the glass layer by an adhesion layer comprising Ta2O5.
申请公布号 US7545625(B2) 申请公布日期 2009.06.09
申请号 US20070004178 申请日期 2007.12.20
申请人 RAYTHEON COMPANY 发明人 DRAB JOHN J.;DOUGHERTY THOMAS K.;KEHLE KATHLEEN A.
分类号 H01G4/06;H01L27/105;H01G4/008;H01G4/10;H01G4/33;H01L21/02;H01L21/316;H01L21/8246 主分类号 H01G4/06
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