发明名称 |
SQUARYLIUM COMPOUND AND PHOTOPOLYMERIZABLE COMPOSITION FOR SHORT-WAVELENGTH LIGHT SOURCE USING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photopolymerizable composition having excellent sensitivity to light in a wavelength region of a short-wavelength light source. <P>SOLUTION: The photopolymerizable composition includes a squarylium compound represented by general formula (I) (wherein R<SP>1</SP>-R<SP>3</SP>are the same or different and represent an alkyl group which may have a substituent, an alkoxyl group which may have a substituent or the like), a radical initiator, and a compound having an ethylenically unsaturated double bond. <P>COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009042491(A) |
申请公布日期 |
2009.02.26 |
申请号 |
JP20070207328 |
申请日期 |
2007.08.09 |
申请人 |
KYOWA HAKKO CHEMICAL CO LTD |
发明人 |
OSETO YUTAKA;YAMANO JUNZO |
分类号 |
G03F7/004;C07F9/54;C07F9/6568;C08F2/50 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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地址 |
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