发明名称 Charged particle beam apparatus and specimen inspection method
摘要 In a multi-charged-particle-beam apparatus, when an electric field and voltage on a surface of a specimen are varied according to characteristics of the specimen, a layout of plural primary beams on the surface of the specimen and a layout of plural secondary beams on each detector vary. Then, calibration is executed to adjust the primary beams on the surface of the specimen to an ideal layout corresponding to the variation of operating conditions including inspecting conditions such as an electric field on the surface and voltage applied to the specimen. The layout of the primary beams on the surface of the specimen is acquired as images displayed on a display of reference marks on the stage. Variance with an ideal state of the reference marks is measured based upon these images and is corrected by the adjustment of a primary electron optics system and others.
申请公布号 US2009001267(A1) 申请公布日期 2009.01.01
申请号 US20080213905 申请日期 2008.06.26
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 ENYAMA MOMOYO;OHTA HIROYA
分类号 G01N23/00 主分类号 G01N23/00
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