| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for measuring a write gap of a thin film magnetic head, with improved measuring accuracy of the write gap. SOLUTION: Part of a wafer is cut by irradiating a position which becomes a media-opposed surface of the thin film magnetic head with an ion beam, and the cut surface is made a measuring target surface. Then, by irradiating the measuring target surface with an ion beam while supplying a carbon gas, a carbon is attached to the measuring target surface, and an SIM image with an invisible grain is obtained. Predetermined operation is performed using this SIM image with an invisible grain to calculate the write gap of the thin film magnetic head. COPYRIGHT: (C)2009,JPO&INPIT
|
