| 摘要 |
PURPOSE:To obtain the titled multi-layered iron nitrogen compd. films having a high magnetic moment by alternately executing sputtering with a target consisting of Fe and target consisting of Fe4N to laminate the films on a substrate then forming Fe8N at the boundary thereof. CONSTITUTION:The sputtering is alternately executed by the target consisting of the Fe and the target consisting of the Fe2N, Fe3N or Fe4N to alternately laminate the Fe and the Fe2N, Fe3N or Fe4N on the substrate. The Fe8N which is the non-equil. iron nitride is formed at the boundary between the Fe layer and the Fe2N layer, Fe3N layer or Fe4N layer for the above-mentioned purpose. The Fe8N is more easily formable if the inter-layer space of the multi-layered films is made <=50Angstrom in the stage of alternately laminating the Fe and the Fe4N. The Fe8N is more easily grown if the multi-layered films are prepd. by sputtering the iron nitrogen compd. after growing the Fe to a specific crystal orientation (100 Miller indice). The multi-layered iron nitrogen compd. films having about >=10wt% content of the Fe8N which is the non-equil. iron nitrogen compd. and having the high magnetic moment are thus obtd.
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