| 摘要 |
A COMPOSITION THAT COMPRISES A PHOTOPOLYMERIZABLE COMPOUND CONTAINING AT LEAST TWO PENDANT UNSATURATED GROUPS; AT LEAST ONE ETHYLENICALLY UNSATURATED PHOTOPOLYMERIZABLE POLYALKYLENE OXIDE HYDROPHILIC MONOMER; AT LEAST ONE NONIONIC SURFACTANT; AND AT LEAST ONE PHOTOINITIATOR IS PROVIDED. THE COMPOSITION ALSO PREFERABLY CONTAINS AT LEAST ONE AMINE MODIFIED ACRYLIC OLIGOMER AND A DYE. OTHER CONVENTIONAL PHOTORESIST COMPONENTS SUCH AS PHOTOSENSITIZERS, ADHESION PROMOTERS, LEVELING AGENTS AND SOLVENTS MAY ALSO BE INCLUDED IN THE COMPOSITION. SUCH COMPOSITIONS ARE USEFUL FOR FORMING A PATTERN ON A SUBSTRATE, SUCH AS PATTERNING MICRO LITHOGRAPHIC CIRCUITS ON A SUBSTRATE.
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