A method of forming a patterned polysilazane film and a method of burning a radiation sensitive polysilazane coating film,申请号KR20077014474-传众专利搜索

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发明名称	A method of forming a patterned polysilazane film and a method of burning a radiation sensitive polysilazane coating film
摘要
申请公布号	KR100804444(B1)	申请公布日期	2008.02.20
申请号	KR20077014474	申请日期	2007.06.25
申请人		发明人
分类号	G03F7/075;C08K5/42;C08L83/16;C09D183/16;G03F7/004;G03F7/38;H01L21/027	主分类号	G03F7/075
代理机构		代理人
主权项
地址

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