发明名称 Wavefront measuring device e.g. lateral shearing interferometer, calibrating method, involves making measurements with different tilting angles of optical components of measuring device relative to test specimen by measuring device
摘要 <p>The method involves making measurements with different tilting angles of optical components of a wavefront measuring device relative to a test specimen (1) by the measuring device. A part of the measurements is made with the different tilting angles with respect to tilting axes, which run by a focus of radiation discharged from the test specimen. Calibration data are determined by evaluation of results of the measurement. The calibration data are considered during measurement of optical parameters such as wavefront, polarization and transmission, of the test specimen. Independent claims are also included for the following: (1) a measuring device for measuring optical parameter of a test specimen in form of a projection illumination system (2) a projection illumination system with a measuring device for measuring optical parameter.</p>
申请公布号 DE102006021965(A1) 申请公布日期 2007.11.15
申请号 DE20061021965 申请日期 2006.05.04
申请人 CARL ZEISS SMT AG 发明人 MANGER, MATTHIAS;SCHELLHORN, UWE
分类号 G01M11/02;G01B9/02 主分类号 G01M11/02
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