发明名称 RADIATION-SENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition giving a transparent cured resin pattern less liable to peel. <P>SOLUTION: The radiation-sensitive resin composition contains an alkali-soluble resin (A) having curability, a quinonediazido compound (B) and a solvent (C), wherein butyl lactate is contained as the solvent (C). <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2007132956(A) 申请公布日期 2007.05.31
申请号 JP20050299847 申请日期 2005.10.14
申请人 SUMITOMO CHEMICAL CO LTD 发明人 YAKO YOSHIKO;TAKEBE KAZUO
分类号 G03F7/023;G03F7/004 主分类号 G03F7/023
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