发明名称 |
Method for etching non-conductive substrate surfaces |
摘要 |
The present patent application relates to a method as well as to an etching solution for etching a non-conductive substrate surface before metallization, in particular for etching polyamide or ABS plastic surfaces. According to the invention, the surfaces to be etched are treated with an etching solution comprising a halogenide and/or nitrate.
|
申请公布号 |
EP1785507(A2) |
申请公布日期 |
2007.05.16 |
申请号 |
EP20060017605 |
申请日期 |
2006.08.24 |
申请人 |
ENTHONE, INC. |
发明人 |
SCHILDMANN, MARK PETER;PRINZ, ULRICH, DR.;KOENIGSHOFEN, ANDREAS, DR. |
分类号 |
C23C18/22;C23C18/16 |
主分类号 |
C23C18/22 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|