发明名称 Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit
摘要 A measurement unit to determine a position in a first and second dimension includes a diffraction type encoder and an interferometer. The diffraction type encoder determines by means of a diffraction on a first and a second diffraction grating the position in the first dimension of the second grating with respect to the first grating, The interferometer determines the position in the second dimension of a mirror. The measurement unit includes a combined optical unit to transfer an encoder measurement beam as well as an interferometer measurement beam. Further, the measurement unit may include a combined light source for the encoder as well as the interferometer. One of the first and second diffraction gratings may further show some degree of zero order reflection to provide the mirror of the interferometer.
申请公布号 US2007058172(A1) 申请公布日期 2007.03.15
申请号 US20050226460 申请日期 2005.09.15
申请人 ASML NETHERLANDS B.V. 发明人 VAN DER PASCH ENGELBERTUS ANTONIUS F.;LOOPSTRA ERIK R.
分类号 G01B9/02 主分类号 G01B9/02
代理机构 代理人
主权项
地址