| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photomask which does not cause a pattern defect after exposure even when a glass substrate for the photomask contains air bubbles and other foreign matters inside. <P>SOLUTION: The photomask comprises a glass substrate (10) for a photomask which includes air bubbles and other foreign matters (11), and has a lens (14) adjacent to an incidence plane (12) corresponding to the position where the air bubbles are present. This configuration prevents a light beam from passing through the air bubbles except when the air bubbles are present very close to the surface of the glass substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
