发明名称 Memory array with sub-minimum feature size word line spacing and method of fabrication
摘要 <p>A non-volatile memory array (30) has word lines (32) spaced a sub-F (sub-minimum feature size F) width apart and bit lines generally perpendicular to the word lines. The present invention also includes a method for word-line patterning of a non-volatile memory array which includes generating sub-F word lines from mask generated elements with widths of at least a minimum feature size F.</p>
申请公布号 EP1746645(A2) 申请公布日期 2007.01.24
申请号 EP20060117424 申请日期 2006.07.18
申请人 SAIFUN SEMICONDUCTORS LTD. 发明人 EITAN, BOAZ;BLOOM, ILAN;IRANI, RUSTOM
分类号 H01L21/8246;H01L21/033;H01L21/3213;H01L27/115 主分类号 H01L21/8246
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