发明名称 |
System, apparatus and method for maskless lithography that emulates binary, attenuating phase-shift and alternating phase-shift masks |
摘要 |
A tilting mirror design for maskless lithography is proposed. In this mirror, the tilting portion occupies about 60% of the entire element area. The surrounding space is made 100% reflective and out-of-phase with respect to the tilting portion. The ratio between the tilting portion of the mirror and the out-of-phase portion is optimized in order to result in equal positive and negative maximum amplitudes over a complete range of tilt angles.
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申请公布号 |
US2006132887(A1) |
申请公布日期 |
2006.06.22 |
申请号 |
US20040018483 |
申请日期 |
2004.12.22 |
申请人 |
ASML HOLDING N.V. |
发明人 |
BABA-ALI NABILA;BLEEKER ARNO |
分类号 |
G02B26/00 |
主分类号 |
G02B26/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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