An electron impact ion source includes an ionization chamber in which a first rf multipole field can be generated and an ion guide positioned downstream from the ionization chamber in which a second rf multipole field can be generated wherein electrons are injected into the ionization chamber along the axis (on-axis) to ionize an analyte sample provided to the ionization chamber.
申请公布号
EP1659612(A2)
申请公布日期
2006.05.24
申请号
EP20050023178
申请日期
2005.10.24
申请人
AGILENT TECHNOLOGIES, INC. (A DELAWARE CORPORATION)