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发明名称
PLASMA ENHANCED SEMICONDUCTOR DEPOSITION APPARATUS
摘要
申请公布号
KR100578136(B1)
申请公布日期
2006.05.10
申请号
KR20040005085
申请日期
2004.01.27
申请人
发明人
分类号
H01L21/205;C23C16/00;C23C16/455;C23C16/513
主分类号
H01L21/205
代理机构
代理人
主权项
地址
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