发明名称 |
Doping method, doping apparatus, and control system for doping apparatus |
摘要 |
A doping method capable of controlling a dose amount in response to a change the ratio in ion species during a doping process, a control system for controlling a doping amount, and a doping apparatus having a control system are provided. An ion current value of a specific ion in an ion beam is measured. There is an ion detector that measures an ion current value of a specific ion in an ion beam and enters the obtained monitor signal into a control means. Set data for setting a predetermined dose amount is entered into the control means, convert data for obtaining an actual dose amount from the monitor signal is entered into the control means by a memory means. The control means performs data processing on the basis of the input monitor signal and the convert data, a control signal for obtaining the predetermined dose amount is entered from the control means to the dose amount control system to dope the controlled ion beam into the target material.
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申请公布号 |
US2006005768(A1) |
申请公布日期 |
2006.01.12 |
申请号 |
US20050222765 |
申请日期 |
2005.09.12 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
NAKAMURA OSAMU |
分类号 |
C23C16/00;H01J37/05;H01J37/317;H01L21/00;H01L21/265 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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